Terrorism, war, recession, a tanking stock market—these tumultuous forces have shaken the R&D enterprise over the past year just as they have the rest of society. It’s too early to quantify those effects just yet, although the National Science Foundation expects to soon release its first estimates for national R&D in 2002. In the meantime, C&EN has gathered the most current data available on where R&D funds are coming from and how they are being spent, as well as other facts and figures of particular interest to the chemical community.

For the most part, data for C&EN’s annual look at R&D derive from publications of NSF’s Division of Science Resources Statistics that are available on the Internet (http://www.nsf.gov/sbe/srs/stats.htm). The patent information is from the Patent & Trademark Office; some of PTO’s reports also are accessible on the Web (http://www.uspto.gov/web/offices/ac/ido/oeip/taf/
reports.htm#AT). This year’s feature was put together byNews Editor Janice R. Long, Associate Editor Sophie L. Wilkinson, and Assistant Managing Editor Pamela S. Zurer, all of C&EN’s Washington, D.C., office.

Note: The following links are available in Adobe PDF format.

	FACTS & FIGURES - INTRODUCTION
	UNIVERSITY & COLLEGES
	Sources of academic R&D funds. Which schools spend the most for chemistry and chemical engineering. Spending on research equipment. Numbers of graduate students and postdoctoral appointees.
	INDUSTRY
	How much companies spend on R&D, particularly within the chemical industry. Where industrial chemists work and how much they are paid. Patent activity of selected U.S. chemical firms.
	FEDERAL GOVERNMENT
	Spending on R&D—with emphasis on chemistry and chemical engineering—by the federal government and its various agencies. Distribution of funds among development and basic and applied research.
	PATENTS & LITERATURE
	Numbers of U.S. chemical and biotechnology patents issued in 2001 and their countries of origin. Fields in which chemical papers are published and the countries where they originate.

Chemical & Engineering News
Copyright © 2002 American Chemical Society